Photoresist composition including polyphenol and sensitizer
AssigneeThe Mead Corporation
InventorsRong-Chang Liang, Alexander R. Pokora, William L. Cyrus, Jr.
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Abstract
A photoresist composition, and a process for using the same are; the composition comprises a polyphenolic resin and a sensitizer effective, when exposed to actinic radiation, to provide alkali solubility to said composition, wherein said resin is represented by the formula (I) or (II): ##STR1## wherein R is a hydrogen atom, a halogen atom, an alkyl group, an alkoxy group, an alkaryl group or an aryl group; R' is a silyl group; and n and n'+m are greater than 3. The composition exhibits high thermal and plasmal resistance and good dissolution characteristics.
Claims20
A photoresist composition consisting essentially of a methylene bridge-free phenolic resin and a sensitizer, said sensitizer being present in an amount effective to render said composition alkaline soluble in areas exposed to actinic radiation, said phenolic resin being represented by the formula (I) or (II):
- ##STR4## wherein R is a hydrogen atom, a halogen atom, an alkyl group, an alkoxy group, an alkaryl group, an aryl group or a silyl group;
- R' is a silyl group;
- and n and n'+m are greater than 3.
A positive-working photoresist composition comprising a phenolic resin and a sensitizer, said sensitizer being present in an amount effective to render said composition alkaline soluble when exposed to actinic radiation and said resin being represented by the formula (I) or (II):
- ##STR6## wherein R is a hydrogen atom, a halogen atom, an alkyl group, an alkoxy group, an alkaryl group, an aryl group or a silyl group;
- R' is a silyl group;
- and n and n'+m are greater than 3, said resin being prepared by reacting a phenol with a peroxidase enzyme in the presence of a peroxide or with an oxidase enzyme in the presence of oxygen in an organic solvent-containing medium.
A material useful in producing a microelectronic component comprising:
- a substrate having front and back surfaces, said front surface having a coating thereon, said coating comprising a photoresist composition, said photoresist composition comprising a phenolic resin and a sensitizer effective, when exposed to actinic radiation, to provide alkaline solubility to said composition,
- wherein said phenolic resin is represented by the formula (I) or (II):
- ##STR7##
Dependencies are inferred from the claim text.