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US 5,211,795 AGranted
Plasma etching apparatus and transporting device used in the same
AssigneeTokyo Electron Limited
InventorsYukimasa Yoshida, Satoshi Kaneko
Life of this patent
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Abstract
A transporting device used in a plasma etching apparatus comprises a loading unit having a loading surface on which articles to be treated are loaded, and a moving mechanism for moving the loading unit. The loading unit is coated with an electrically conducting layer for moving electric charges accumulated on the loading surface due to plasma etching and preventing erosion of the loading unit.
Claims14
A transporting device used in a plasma etching apparatus, comprising:
- a loading unit having a loading surface on which articles to be treated are loaded;
- means for moving said loading unit;
- and
- means for removing electric charges accumulated on said loading surface and preventing erosion of the loading unit.
1 more element
A plasma etching apparatus comprising:
- (a) housing means for containing articles to be treated;
- (b) a process chamber for plasma-etching said articles to be treated;
- and
- (c) transporting means for transporting said articles to be treated from said housing means into said process chamber, said transporting means including:
- (i) a loading unit having a loading surface coated with an electrically conducting layer and carrying said articles to be treated, said electrically conducting layer being electrically connected to ground;
- and
- (ii) moving means for moving said loading unit.
4 more elements
Dependencies are inferred from the claim text.