Chemical vapor deposition apparatus for forming thin film
AssigneeKawasaki Steel Corporation
InventorsTomohiro Ohta, Eiichi Kondoh, Tohru Mitomo, Kenichi Otsuka, Hiroshi Sekihashi
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Abstract
An apparatus for forming, by a chemical vapor deposition process, a thin film of crystals such as diamond on a surface of a heated substrate placed in a reaction vessel. The apparatus has a substrate supporting structure, a heater for heating the substrate by heat conduction or by electric current supplied directly to the substrate, and a cooling device for cooling the substrate. The heater is controlled in accordance with the measured temperature of the substrate so as to accurately maintain the substrate temperature at a constant level.
Claims7
An apparatus for forming, by chemical vapor deposition, a thin film on a surface of a heated substrate placed in a vessel, said apparatus comprising:
- gas supplying and exhausting means for supplying a source gas into said vessel and exhausting the resultant gas from said vessel;
- decomposing means for decomposing said source gas;
- substrate supporting means for supporting said substrate;
- substrate cooling means for cooling said substrate;
- substrate heating means for heating said substrate;
- substrate temperature measuring means for measuring a temperature of said substrate wherein said substrate temperature measuring means measures, in a non-contacting manner, the temperature of the surface of said substrate which is opposite to the substrate surface on which said film is formed;
- and
- substrate temperature control means for controlling said temperature of said substrate.
An apparatus for forming, by chemical vapor deposition, a thin film on a surface of a heated substrate placed in a vessel, said apparatus comprising:
- gas supplying and exhausting means for supplying a source gas into said vessel and exhausting the resultant gas from said vessel;
- decomposing means for decomposing said source gas;
- substrate supporting means for supporting said substrate;
- substrate cooling means for cooling said substrate;
- substrate heating means for heating said substrate, wherein said substrate heating means comprises a heating electric power supply and power supply electrodes, said power supply electrodes comprising said substrate cooling means;
- substrate temperature measuring means for measuring a temperature of said substrate;
- and
- substrate temperature control means for controlling said temperature of said substrate.
Dependencies are inferred from the claim text.