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US 5,208,133 AGranted
Photosensitive resin composition
AssigneeSony Corporation
InventorToshiro Tsumori
Life of this patent
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AssigneeSony Corporation
InventorToshiro Tsumori
Estimating the term…
A photosensitive resin composition, which is a mixture of a base resin, an acid cross-linking agent and a photoreactive acid catalyst generator, is disclosed. The photoreactive acid catalyst generator contains tetrakis-1,2,4,5-(polyhalomethyl)benzene or tris(polyhalomethyl)benzene. The composition is a so-called three-component chemically amplified photoresist. When irradiated with an excimer laser light, the photoreactive acid generator is decomposed to yield a Lewis acid catalyst, while also yielding radicals, the photoreactive acid generator acting itself as an acid-linking auxiliary to improve the sensitivity of the photosensitive resin composition significantly. It becomes possible in this manner to form a fine resist pattern with superior resolution in the excimer laser lithography. On the other hand, the sensitivity dependency of the base resin or light transmittance may be lowered to increase the degree of freedom in material selection and designing.
A photosensitive resin composition, comprising a mixture of a base resin, an acid cross-linking agent and a photoreactive acid catalyst generator, wherein said base resin is any one of cresolnovolak resin, polyvinyl phenol or vinyl phenol-methyl methacrylate copolymer, and wherein the improvement resides in that
A photosensitive resin composition, comprising a mixture of a base resin, an acid cross-linking agent and a photoreactive acid catalyst generator, wherein said acid cross-linking agent is hexamethoxymethylmelamine, and wherein the improvement resides in that
A photosensitive resin composition, comprising a mixture of a base resin, an acid cross-linking agent and a photoreactive acid catalyst generator, wherein said photoreactive acid catalyst generator and said acid cross-linking agent are contained in amounts of 0.1 to 10 parts by weight and 0.1 to 10 parts by weight, respectively, to 100 parts by weight of the base resin, and wherein the improvement resides in that
A photosensitive resin composition, comprising a mixture of a base resin, an acid cross-linking agent and a photoreactive acid catalyst generator, wherein said base resin is any one of cresol-novolak resin, polyvinyl phenol or vinylphenol-methyl methacrylate copolymer, and wherein the improvement resides in that
A photosensitive resin composition, comprising a mixture of a base resin, an acid cross-linking agent and a photoreactive acid catalyst generator, wherein said acid cross-linking agent is hexamethoxymethylmelamine, and wherein the improvement resides in that
A photosensitive resin composition, comprising a mixture of a base resin, an acid cross-linking agent and a photoreactive acid catalyst generator, wherein said photoreactive acid catalyst generator and said acid cross-linking agent are contained in amounts of 0.1 to 10 parts by weight and 0.1 to 10 parts by weight, respectively, to 100 parts by weight of the base resin, and wherein the improvement resides in that
Dependencies are inferred from the claim text.