Process and device for the deposition of thin layers and product made thereby
AssigneeSaint Gobain Vitrage Int'l. "Les Miroirs"
InventorsPierre Balian, Jean-Paul Rousseau
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Abstract
This invention relates to a process and a device for the deposition of thin layers on a substrate using a plasma-CVD technique. The substrate itself, which previously has been made conductive by the deposition of conductive layers, is used as an electrode to create the discharge. In particular, the technique can be applied to the deposition of organosilicon layers on glass plates of large dimensions. The invention also relates to a glass substrate covered by thin layers including at least one metal layer, in particular silver, on which the organosilicon layer is deposited according to the process.
Claims13
A process for the deposition of a protective layer comprising the steps of:
- providing an electrically grounded vacuum chamber;
- providing a substrate comprising an electrically conductive surface acting as an electrode, said substrate being fixed in position relative to said vacuum chamber;
- and
- depositing a material on said substrate by performing plasma chemical vapor deposition by applying an alternating current between said conductive surface of said substrate and said vacuum chamber wherein said alternating current is applied to said conductive surface of said substrate by at least one power lead-in, said power lead-in comprising a conductive element contacting said substrate along an entire edge and an insulating element covering said conductive element except where said conductive element contacts said substrate and except where a conductor for supplying said alternating current makes contact with the conductive element.
Dependencies are inferred from the claim text.