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US 5,204,226 AGranted
Photosensitizers for polysilanes
AssigneeInternational Business Machines Corporation
InventorsMark E. Baier, Robert D. Miller, Gregory M. Wallraff
Life of this patent
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Abstract
The present invention relates to positive resist compositions comprising polysilanes and sulfosuccinimide photosensitizers and the use of these compositions in making integrated circuits.
Claims2
A process for generating a positive tone resist image in a film comprising the steps of (a) forming a film comprising polyphenysilane and sulfosuccinimide;
- (b) imagewise exposing the film to radiation and (c) developing the image in the film.
Dependencies are inferred from the claim text.