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US 5,204,218 AGranted
Photosensitive resin composition
AssigneeMitsubishi Denki Kabushiki Kaisha
InventorsTeruhiko Kumada, Youko Tanaka, Hideo Horibe, Shigeru Kubota, Hiroshi Koezuka
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Abstract
Disclosed herein is a photosensitive resin composition containing: a photobase generator expressed in the following general formula (I): ##STR1## where R.sub.1, R.sub.2 and R.sub.3 are individually selected from the group consisting of hydrogen, halogen, alkyl groups, alkenyl groups, alkinyl groups, phenyl groups and alkoxy groups; and a base-catalytic reaction compound which is cured or decomposed under basic conditions.
Claims23
A photosensitive resin composition containing:
- a photobase generator expressed in the following general formula (I):
- ##STR4## where R.sub.1, R.sub.2 and R.sub.3 are individually selected from the group consisting of hydrogen, halogen, alkyl groups, alkenyl groups, alkinyl groups, phenyl groups and alkoxy groups;
- and
- a base-catalytic reaction compound which reacts under basic conditions.
1 more element
Dependencies are inferred from the claim text.