Cleaning apparatus for substrate
AssigneeHitachi, Ltd.
InventorsMasahiro Watanabe, Mitsuyoshi Otake, Megumi Hamano
Life of this patent
Estimating the term…
Abstract
A cleaning apparatus capable of substantially complete removal of contaminations generated during the manufacturing process of glass substrates, semiconductor wafers, magnetic disk substrates, magnetic head substrates or the like. The cleaning apparatus comprises a cleaning bath which is greater in cross section than the material to be cleaned and which has an opening portion for insertion of the material to be cleaned, and an ultrasonic transducer attached to the cleaning bath. The apparatus precludes various defects arising from contaminations, and enhances reliability and yield of the substrates manufactured.
Claims16
A cleaning apparatus comprising a cleaning bath having a cross section greater than the cross section of a material to be cleaned, the cleaning bath provided with an opening portion for insertion of the material to be cleaned, means for feeding a cleaning liquid under pressure into the cleaning bath through a piping, and an ultrasonic transducer attached t the cleaning bath, wherein the piping has a cross section greater than the difference between the cross section of the cleaning bath and the cross section of the material to be cleaned.
The cleaning apparatus as set forth in 1, further comprising means for feeding the material to be cleaned into the cleaning bath.
A cleaning apparatus for cleaning a material, comprising a tank for containing a cleaning liquid and including an opening portion for insertion of the material to be cleaned, means including a pump for feeding the cleaning liquid under pressure through a piping and to the tank so as to apply the cleaning liquid under pressure to at least one surface of the material to be cleaned, and at least one ultrasonic transducer attached to the tank, wherein the tank has a cross-section greater than the cross-section of the material to be cleaned and the piping has a cross-section greater than the difference between the cross-section of the tank and the cross-section of the material to be cleaned so as to enable an increased flow velocity of the cleaning liquid in the proximity of the material to be cleaned and an improved cleaning thereof.
Dependencies are inferred from the claim text.