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US 5,186,192 AGranted
Apparatus for cleaning silicon wafer
AssigneesShin-Etsu Handotai Co., Ltd., Pre-Tech Co., Ltd.
InventorsShigeyoshi Netsu, Masaki Kameya, Yasuyuki Harada, Hiroshi Amano
Life of this patent
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Abstract
Device for cleaning silicon wafers having an upper mist-generating chamber with a high frequency oscillator to generate an aqueous hydrofluoric acid mist and a lower region processing chamber separated by a partitioning wall having a shutter to open and close. Silicon wafers are held in an upright position in a rack. The processing chamber and the shutter have gas jets to eject gas between the silicon wafers and water spray heads in the processing chamber to spray water between the silicon wafers.
Claims7
A silicon wafer-cleaning apparatus comprising:
- a chamber which is divided into an upper region and a lower region by a partitioning wall having a communication section, said upper region defining a mist-generating chamber and said lower region defining a processing chamber;
- opening/closing means including a shutter for closing the communication section of the partitioning wall;
- a high-frequency oscillation member, attached to the chamber, for generating mist of an aqueous hydrofluoric acid solution in the mist-generating chamber;
- a high-frequency oscillator for supplying high-frequency power to the high-frequency oscillation member;
- conveyance means for conveying a storage member, in which a plurality of silicon wafers are held in an upright state, to the processing chamber;
- a plurality of gas-ejecting means, attached to the chamber and the shutter, for ejecting a gas toward regions between the silicon wafers held in the storage member;
- pure water-spraying means, attached to the chamber, for spraying pure water toward regions between the silicon wafers held in the storage member;
- and
- gas exhaust means arranged inside the processing chamber to be lower than the storage member.
6 more elements
Dependencies are inferred from the claim text.