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US 5,183,685 AGranted
Diamond film deposition by ECR CVD using a catalyst gas
AssigneeSemiconductor Energy Laboratory Co., Ltd.
InventorShumpei Yamazaki
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Abstract
Diamond films can be formed on a surface by virtue of a microwave energy. A catalyst gas is introduced into a reaction chamber for ECR CVD, along with a carbon compound gas. The catalyst gas consists of a gaseous compound of nickel, germanium and/or manganese such as NiH.sub.2 NiF, NiO, NiF(H.sub.2 O)n (where n=1.3), Ni(CN).sub.2, Ni(C.sub.5 H.sub.5).sub.2, GeH.sub.4, GeF.sub.4, manganese carboxyl, MnF.sub.2 and so forth.
Claims12
A method of depositing a diamond coating comprising the steps of:
- placing an object for deposition in a reaction chamber;
- introducing a carbon compound gas into said reaction chamber;
- and
- inputting an electromagnetic power to said reaction chamber in order to decompose said carbon compound gas and deposit the diamond on the surface of said object,
- wherein a catalytic gas is introduced into said reaction chamber in order to expedite the deposition of said diamond, said catalytic gas being selected from the group consisting of the halide of nickel, the hydride of nickel and the halide of manganese.
2 more elements
A method of depositing a diamond coating comprising the steps of:
- placing an object for deposition in a reaction chamber;
- introducing a carbon compound gas into said reaction chamber;
- and
- inputting an electromagnetic power to said reaction chamber in order to decompose said carbon compound gas and deposit the diamond on the surface of said object,
- wherein a catalytic gas is introduced into said reaction chamber in order to expedite the deposition of said diamond, said catalytic gas being selected from the group consisting of NiF, NiO, NiF(H.sub.2 O).sub.1.3, Ni(CN).sub.2, Ni(C.sub.5 H.sub.5).sub.2, manganese carbonyl and MnF.sub.2.
2 more elements
Dependencies are inferred from the claim text.