Method of cleaning semiconductor wafer and computer disks by purified water treated with electric AC signal
AssigneeAquotech, Inc.
InventorBarry L. Bragger
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Abstract
Described is a process for utilizing an electric AC signal of a frequency preferably between 0.1 kHz and 1 GHz to modify and otherwise enhance the properties of deionized water used for the purpose of cleaning semiconductor wafers and computer storage disks before, during and after processing. Such treatment of the cleaning water enhances its ability to remove process chemicals, remove particulates, and otherwise improve the speed and economy of the cleaning process thereby directly improving the final yield of the chip or disk making process.
Claims12
A method of cleaning semiconductor wafers, comprising the steps of:
- (a) treating purified water with an electrical AC signal to alter its cleansing characteristics;
- said AC signal being at a frequency in the range of 0.1 KHz to 1 GHz,
- (b) rinsing a semiconductor wafer with the treated, purified water to remove contaminants.
A method of cleaning computer storage disks, comprising the steps of:
- (a) treating purified water with an electrical AC signal to alter its cleansing characteristics, said AC signal being at a frequency in the range of 0.1 KHz to 1 GHz;
- (b) rinsing a computer storage disk with the treated, purified water to remove contaminants.
Dependencies are inferred from the claim text.