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AssigneeMorton International, Inc.
InventorsRichard M. Lazarus, Randall Kautz, Sunit S. Dixit
Estimating the term…
Novolak resins are provided which are the condensation product of (a) a phenol, phenol derivative, or mixtures thereof, and (b) a mixture of formaldehyde or a formaldehyde precursor and (1) a monohydroxy aromatic aldehyde and wherein at least a portion of the hydroxyl groups thereof are esterified or (2) a mixture of at least one monohydroxy aromatic aldehyde and at least one non-hydroxylic aromatic aldehyde; the novolak resins having a hydroxyl number of from about 120 to about 180 grams of resin per equivalent of hydroxyl. The novolak resins are especially useful in positive photoresist formulations and have enhanced photospeed and film loss characteristics as well as improved thermal stability.
A esterified novolak resin comprising the condensation product of:
A positive photoresist comprising an admixture of a bindingly effective amount of a esterified novolak resin and a photoimaging amount of a photosensitizier;
A substrate coated with a thermally stable and highly resolved, exposed resist pattern, said resist pattern being formed from a positive photoresist composition which, prior to exposure to actinic radiation, comprises a bindingly effective amount of a esterified novolak resin and a photoimaging amount of photosensitizer;
Dependencies are inferred from the claim text.