Positive photosensitive planographic printing plates containing specific high-molecular weight compound and photosensitive ester of O-napthoquinonediazidosulfonic acid with polyhydroxybenzophenone
AssigneesMitsubishi Kasei Corporation, Konica Corporation
InventorsHiroshi Tomiyasu, Yoshiko Kobayashi, Kiyoshi Goto, Takeshi Yamamoto, Hideyuki Nakai
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Abstract
A positive photosensitive planographic printing plate is disclosed which has a photosensitive layer comprising in combination a specific o-naphthoquinonediazidosulfonic ester and a resin having a specific structural unit(s). Said photosensitive layer may also contain a novolak resin and/or an organic acid.
Claims17
A positive photosensitive planographic printing plate comprising a support with a photosensitive layer thereon, said photosensitive layer consisting essentially of in admixture:
- (A) 5 to 50% by weight of a photosensitive ester of o-naphthoquinonediazidosulfonic acid and a polyhydroxybenzophenone;
- and
- (B) 50 to 95% by weight of a high-molecular weight compound comprising the structural unit represented by the general formula (I):
- ##STR32## wherein R.sup.1 and R.sup.2 represent independently a hydrogen atom, a halogen atom, a alkyl group, an aryl group or a carboxyl group;
- R.sup.3 represents a hydrogen atom, a halogen atom, an alkyl group or an aryl group;
- R.sup.4 represents a hydrogen atom, an alkyl group, an aryl group or an aralkyl group;
- Y represents an aromatic group which may be substituent(s);
- X represents a divalent organic group linking the nitrogen atom and a carbon atom of said aromatic group;
- m represents an integer of 0 or 1;
- and n represents an integer from 0 to 5.
A positive photosensitive planographic printing plate comprising a support with a photosensitive layer thereon, said photosensitive layer consisting essentially of in admixture:
- (A) 5 to 50% by weight of a photosensitive ester of o-naphthoquinonediazidosulfonic acid and a polyhydroxybenzophenone;
- (B) 45 to 95% by weight of a high-molecular weight compound comprising the structural unit represented by the general formula (I):
- ##STR34## wherein R.sup.1 and R.sup.2 represent independently a hydrogen atom, a halogen atom, or an alkyl, an aryl or a carboxyl group;
- R.sup.3 represents a hydrogen atom, a halogen atom, or an alkyl or an aryl group;
- R.sup.4 represents a hydrogen atom, or an alkyl, an aryl or an aralkyl group;
- Y represents an aromatic group which may have substituent(s);
- X represents a divalent organic group linking the nitrogen atom and a carbon atom of said aromatic group;
- m represents an integer of 0 or 1;
- and n represents an integer of 0 to 5;
- and
- (C) 0.01 to 50% by weight of novolak resin.
Positive photosensitive planographic printing plate comprising a support with a photosensitive layer thereon said photosensitive layer consisting essentially of in admixture:
- (A) 5 to 50% by weight of a photosensitive ester of o-naphthoquinonediazidosulfonic acid and a polyhydroxybenzophenone;
- (B) 50 to 90% by weight of a high-molecular weight compound comprising the structural unit represented by the general formula (I):
- ##STR36## wherein R.sup.1 and R.sup.2 represent independently a hydrogen atom, a halogen atom, or an alkyl group, an aryl group or a carboxyl group;
- R.sup.3 represents a hydrogen atom, a halogen atom, an alkyl group or an aryl group;
- R.sup.4 represents a hydrogen atom, an alkyl group, an aryl group or an aralkyl group;
- Y represents an aromatic group which may have substituent(s);
- X represents a divalent organic group linking the nitrogen atom and a carbon atom or said aromatic group;
- m represents an integer of 0 or 1;
- and n represents an integer from 0 to 5;
- l and
- (D) 0.05 to 10% by weight of an organic acid having a pKa value of 2 or greater.
Dependencies are inferred from the claim text.