Stationary magnetron sputtering cathode for a vacuum coating apparatus
AssigneeLeybold Aktiengesellschaft
InventorsWolfram Maass, Ulrich Patz
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AssigneeLeybold Aktiengesellschaft
InventorsWolfram Maass, Ulrich Patz
Estimating the term…
A stationary magnetron sputtering cathode for vacuum coating systems for substrates 17 passing in front of the cathode 10 on a circular path K and disposed on a substrate holder 4 has a circular disk-like yoke plate 15, and a first group or row of magnets 14b, 14b'. . . , essentially forming a closed circular ring, is provided in the marginal zone of the yoke plate 15 and a second group or row of magnets 14a, 14a'. . . , forming a random but essentially symmetric configuration, is provided in the center of the yoke plate 15. The segment of the magnetic tunnel located in the half (III+IV) of the yoke plate 15 which faces away from the rotating shaft 5 of the substrate holder 4 has a greater total length than the tunnel segment provided on the half (I+II) of yoke plate 15 facing toward the rotating shaft 5.
Stationary magnetron sputtering cathode vacuum deposition apparatus, comprising
Dependencies are inferred from the claim text.