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US 5,178,987 AGranted
Aqueous developable deep UV negative resist containing benzannelated acetic acid and novolak resin
AssigneeOlin Corporation
InventorsSydney G. Slater, Stanley A. Ficner
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Abstract
A radiation-sensitive mixture useful as a negative-working photoresist composition comprising: (a) at least one novolak resin; and (b) a photoactive benzannelated acetic acid selected from formula (I): ##STR1## wherein X is either an oxygen, sulfur or ##STR2##
Claims5
A radiation-sensitive mixture useful as a negative-working photoresist composition comprising the admixture:
- (a) at least one novolak resin;
- and
- (b) a photoactive benzannelated acetic acid selected from formula (I):
- ##STR6## wherein X is either an oxygen, sulfur or ##STR7##
1 more element
Dependencies are inferred from the claim text.