Positive type photoresist developer
AssigneeMitsubishi Gas Chemical Company, Inc.
InventorsTetsuo Aoyama, Susumu Kaneko
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Abstract
A positive type photoresist developer which comprises an aqueous solution of quaternary ammonium hydroxide represented by the general formula; ##STR1## (wherein all the symbols are as defined in the appended claims) and hydrazine or hydrazine and a nonionic surfactant is disclosed. The developer can form a fine pattern having a high degree of resolution and can provide an excellent profile with few irregularities in pattern dimensions.
Claims22
A positive type photoresist developer which comprises (a) an aqueous solution of a quaternary ammonium hydroxide of the formula (I):
- ##STR4## wherein R.sup.1 to R.sup.4 are identical or different and are independently an alkyl group having 1 to 4 carbon atoms and (b) hydrazine, wherein the concentration of hydrazine is 50 to 5,000 ppm and the concentration of the quaternary ammonium hydroxide is 1 to 6% by weight.
A positive type photoresist developer which comprises (a) an aqueous solution of quaternary ammonium hydroxide of the formula (I):
- ##STR5## wherein R.sup.1 to R.sup.4 are identical or different and are independently an alkyl group having 1 to 4 carbon atoms, and (b) hydrazine and (c) at least one nonionic surfactant selected from the group consisting of a polyoxyethylene alkyl ether type nonionic surfactant of the formula:
- R--O--CH.sub.2 CH.sub.2 O).sub.n H
- wherein R is an alkyl group having 6 to 18 carbon atoms and n is 8 to 15, a polyoxyethylene aryl ether type nonionic surfactant of the formula:
- ##STR6## wherein R is an alkyl group having 6 to 18 carbon atoms and m is 5 to 30, and a polyoxyethylene alkyl ester type nonionic surfactant of the formula:
- RCOO--CH.sub.2 CH.sub.2 O).sub.l H
- wherein R is an alkyl group having 6 to 18 carbon atoms and l is 5 to 30, wherein the concentration of the quaternary ammonium hydroxide is 1 to 6% by weight, the concentration of hydrazine is 50 to 5000 ppm and the concentration of the nonionic surfactant is 10 to 5000 ppm.
Dependencies are inferred from the claim text.