Apparatus for wafer processing with in situ rinse
AssigneeFSI International, Inc.
InventorsRex L. Biggerstaff, Charles W. Skinner, Daniel J. Syverson, Mark L. Jenson, James G. Kegley
Life of this patent
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Abstract
A wafer processing apparatus including a head defining an etching chamber, the sidewall of the head being slidable along the base so that the sidewall and base will normally define an etch chamber; and the sidewall may be moved upwardly to open a discharge passage for rinsing water, and a deflecting surface for deflecting the rinsing water downwardly and draining the rinsing water from the passage. The housing is separable above the deflector ring to provide access to the wafer for inserting the wafer and replacing it.
Claims14
Apparatus for etching and rinsing a single semiconductor wafer, comprising
- head means defining an etching chamber capable of being opened and closed to permit a wafer to be loaded into and removed from the chamber,
- support means mounting a wafer in the chamber, said support means being capable of rotating the wafer,
- means flowing and interrupting flow of etchant gas and other gas through the chamber and across at least a portion of the wafer,
- a source of rinsing liquid comprising a duct into the etching chamber to direct the rinsing liquid onto and across the wafer,
- and means collecting the rinsing liquid from the chamber.
Apparatus for etching and rinsing a semiconductor wafer comprising
- a housing comprising a closed etching chamber and a peripheral sidewall enclosing the chamber,
- rotatable support means in the etching chamber suitable for mounting and rotating such a wafer,
- means flowing and interrupting flow of etchant gas and other gas through the chamber and across at least a portion of the wafer,
- means directing rinsing liquid into the etching chamber and onto and across the wafer on the support means, and
- the peripheral sidewall comprising open passage means around at least a portion of the sidewall and opposite the rotatable support means and wafer to receive rinsing liquid slung from the rotating wafer.
Dependencies are inferred from the claim text.