Perforated processing apparatus and method
AssigneeDelphi Technology, Inc.
InventorsJohn B. Keable, Steve Bostic
Life of this patent
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AssigneeDelphi Technology, Inc.
InventorsJohn B. Keable, Steve Bostic
Estimating the term…
A substantially closed processing station designed to disperse chemicals for uniformly coating or otherwise contacting an emulsion-coated or other surface is disclosed. The station includes opposed chemical chambers, each of which is covered with a perforated film and, optionally, a screen-like material, between which materials the photographic film or other substrate passes. Distension of the upper perforated film ensures contact between the film (or the screen) and the photographic film moving through the station while minimizing the pressure on and resulting abrading of the substrate's surface. Because the matched peripheries of the upper and lower chambers are closely fitted, the processing station is virtually sealed from the surrounding atmosphere and little degradation of the processing chemicals occurs even after extended periods of nonuse.
An apparatus for processing a photographic emulsion on the first surface of a substrate having opposed first and second surfaces, comprising:
An apparatus for processing a photographic emulsion comprising:
An apparatus for dispersing fluid onto a photosensitive material comprising:
An apparatus for dispersing fluid onto a photosensitive material comprising:
A method for processing photographic emulsion on the first surface of a flexible substrate having opposed first and second surfaces, comprising the steps of:
A method for dispersing fluid onto a photosensitive material comprising the steps of:
An apparatus for dispersing fluid onto a photosensitive material comprising:
A method for processing photographic emulsion on a flexible substrate comprising the steps of:
Dependencies are inferred from the claim text.