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US 5,110,706 AGranted
I-line radiation-sensitive alkali-soluble resin composition utilizing 1,2-quinone diazide compound and hydroxy-chalcone additive
AssigneeJapan Synthetic Rubber Co., Ltd.
InventorsYoshiji Yumoto, Tsutomu Shimokawa, Takao Miura
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Abstract
A radiation-sensitive resin composition comprises (a) an alkali-soluble resin, (b) a 1,2-quinone diazide compound, and (c) an aromatic compound having a specified molecular structure, as essential constituents. The composition is extremely useful for forming a positive type photoresist on a substrate having a high reflectance.
Claims4
An i-line of ultraviolet radiation sensitive resin composition comprising an admixture of:
- (a) 100 parts by weight of an alkali-soluble resin;
- (b) 5 to 100 parts by weight of a 1,2-quinone diazide compound, which may have reacted with the alkali-soluble resin to form a condensate;
- and
- (c) 0.1 to 10 parts by weight of a compound which is at least one compound selected from the group consisting of 4-hydroxy-4'-methylchalcone, 4-hydroxy-3', 4'-dimethoxychalcone, 4-hydroxy-3',4',5'-trimethoxychalcone, 4-hydroxy-3',4'-dioxylenylchalcone and 4-hydroxy-3',4'-dimethylchalcone.
1 more element
Dependencies are inferred from the claim text.