Device for transporting and positioning semiconductor wafer-type workpieces

A process for the wet-chemical surface treatment and/or cleaning of wafer-type workpieces, comprising the steps of:

• causing at least one liquid to act on a wafer surface for said wet-chemical surface treatment and/or cleaning;
• subjecting the wafers to at least one transportation operation by means of said at least one liquid media;
• and
• passing the wafers through at least one device including a guideplate having lateral walls and a plate bottom defining a transportation space including a retardation region and a rotation region;
• feed nozzle means arranged in said plate bottom and inclined in the direction of transportation, for forcing said at least one liquid into the transportation space;
• and retardation nozzle means arranged in the guideplate at an angle inclined in opposition to the direction of transportation, for supplying said at least one liquid to said retardation region;
• and rotation nozzle means arranged radially from a common center in the guideplate at an angle inclined in the direction of rotation, for supplying said fluid media to said rotation region.