Copper dry etch process using organic and amine radicals
AssigneeTexas Instruments Incorporated
InventorMonte A. Douglas
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Abstract
An etch process for etching copper layers that is useable in integrated circuit fabrication is disclosed which utilizes organic and amine radicals to react with copper, preferrable using photoenergizing and photodirecting assistance of high intensity ultraviolet light, to produce a product which is either volatile or easily removed in solution. The process is anisotropic.
Claims24
A process for etching a copper layer on a substrate to form patterned conductors comprising the steps of:
- masking areas of said copper layer which areas are not intended to be etched;
- introducing an organic parent molecule to said copper layer, irradiating said organic parent molecule with high intensity ultraviolet light to produce organic radicals, the organic radicals for reacting with said copper layer to form an organic reaction product.
A process for etching a copper layer on a substrate to form patterned conductors comprising the steps of:
- masking areas of said copper layer which areas are not intended to be etched;
- introducing an amine parent molecule to said copper layer, irradiating said amine parent molecule with high intensity ultraviolet light to produce amine radicals, the amine radicals for reacting with the copper layer to form a copper amine reaction product.
A process for etching a copper layer on a substrate to form patterned conductors comprising the steps of:
- masking areas of said copper layer which areas are not intended to be etched;
- producing an organic radical;
- introducing said organic radical to said copper layer;
- and
- exposing the copper layer and organic radical to an energy source, the organic radical reacting with said copper layer to form an organic copper reaction product.
A process for etching a copper layer on a substrate to form patterned conductors comprising the steps of:
- masking areas of said copper layer which areas are not intended to be etched;
- producing an amine radical;
- introducing said amine radical to said copper layer, exposing the copper layer and amine radical to an energy source, the amine radical reacting with said copper layer to form an amine copper reaction product.
Dependencies are inferred from the claim text.