Heat developable light-sensitive material containing an amidine based precursor
AssigneeFuji Photo Film Co., Ltd.
InventorsYoshiharu Yabuki, Hiroyuki Hirai
Life of this patent
Estimating the term…
Loading patent…
AssigneeFuji Photo Film Co., Ltd.
InventorsYoshiharu Yabuki, Hiroyuki Hirai
Estimating the term…
A heat developable light-sensitive material comprising a support having thereon at least one layer containing a base precursor, a lgiht-sensitive silver halide, a binder, and a dye-providing substance which produces or releases a diffusible dye in correspondence or countercorrespondence to the reduction of the light-sensitive silver halide to silver at an elevated temperature, the base precursor comprising a salt of a carboxylic acid and a diacidic, triacidic or tetraacidic organic base comprising a hydrocarbon group or a heterocyclic group substituted with 2 to 4 amidine groups represents by formula (I-2): ##STR1## wherein R.sup.15, R.sup.16 and R.sup.17 are as defined in the specification. The heat developable light-sensitive material has excellent age preservability and provides a high sensitivity and low-fog image.
A heat developable light-sensitive material comprising a support having thereon at least one layer containing a base precursor, a light-sensitive silver halide, a binder, and a dye-providing substance which produces or releases a diffusible dye in correspondence or countercorrespondence to the reduction of the light-sensitive silver halide to silver at an elevated temperature, said base precursor comprising a salt of a carboxylic acid and a diacidic, triacidic or tetraacidic organic base comprising a hydrocarbon group or a heterocyclic group substituted with 2 to 4 amidine groups, said amidine group substituents being obtained by removing a hydrogen atom from a group represented by formula (I-2):
Dependencies are inferred from the claim text.