Master hologram and micropattern replication method
OwnerMichael Teitelinventor
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OwnerMichael Teitelinventor
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A hologram is directly recorded in a sensitized metal substrate. The hologram may be an amplitude hologram, or may be treated to produce a phase relief hologram which may be stamped into a plastic material for reproduction, be archivally stored, or used as a master for electroforming a second durable surface relief hologram for use as an embossing master. A suitable material is prepared from a polished silver plate exposed to halogen vapors. After exposure, the plate is developed and fixed, and the surface is differentially etched to form a surface relief suitable for hologram embossing. Daguerreotype processes are modified to make surface amplitude holograms and phase holograms. By etching through a metal film a semiconductor mask is obtained. By depositing a silver film directly on a wafer, masks are made with very high feature definition.
A method of recording a hologram light pattern so as to make a master pattern having a surface relief suitable for direct replication by embossing, such method comprising the steps of:
A method of recording a microscopic surface relief pattern corresponding to the amplitude of a radiation field of interfering coherent waves, such surface relief pattern having variations of surface height below approximately one micron, wherein the method comprises the steps of
A method of making a holographic pressing master for embossing a desired phase hologram such method comprising the steps of:
A method of recording a pattern of electromagnetic radiation so as to make a master pattern having a surface for modulating electromagnetic radiation in accordance with said master pattern, such method comprising the steps of
Dependencies are inferred from the claim text.