Apparatus for atomic layer epitaxial growth
AssigneeCS Halbleiter -und Solartechnologie GmbH
InventorChristoph Scholz
Life of this patent
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Abstract
An apparatus for carrying out atomic layer epitaxial growth of a thin semiconductor layer on a substrate surface has a cylindrical chamber in which a substrate holder is coaxially mounted so as to define an annular gap therebetween. The substrate holder can be in the form of a rotatable turbine wheel and a funnel-shaped hood introduces a reactant gas onto the substrate at an oblique angle.
Claims10
An apparatus for carrying out atomic layer epitaxial growth of a thin semiconductor layer on a substrate surface by the use of reactant gases, said apparatus comprising a cylindrical chamber having an upper and a lower end and a vertically disposed axis;
- a substrate holder coaxially mounted within said cylindrical chamber so as to define an annular gap therebetween, said substrate holder comprising means for supporting a substrate in a plane located at a central portion of said cylindrical chamber upper end and disposed perpendicular to said cylindrical chamber vertical axis;
- a reactant gas inlet positioned above said substrate holder;
- and a funnel-shaped hood connecting said reactant gas inlet with said cylindrical chamber upper end, said funnel-shaped hood having a base portion attached to said cylindrical chamber upper end and tapering upwardly toward an upper end thereof provided at said reactant gas inlet, said funnel-shaped hood additionally having a lengthwise disposed axis that forms an acute angle with said cylindrical chamber vertical axis.
An apparatus for carrying out atomic layer epitaxial growth of a thin semiconductor layer on a substrate surface by the use of reactant gases, said apparatus comprising a cylindrical chamber having an upper and a lower end and a vertically disposed axis;
- a substrate holder coaxially and rotatably mounted within said cylindrical chamber so as to define an annular gap therebetween, said substrate holder having means for causing rotation provided on an outside surface thereof and being caused to rotate by gas flowing through the annular gap between the substrate holder and the cylindrical chamber, said substrate holder additionally comprising means for supporting a substrate in a plane located at a central portion of said cylindrical chamber upper end and disposed perpendicular to said cylindrical chamber vertical axis;
- a reactant gas inlet positioned above said substrate holder;
- and a funnel-shaped hood connecting said reactant gas inlet with said cylindrical chamber upper end, said funnel-shaped hood having a base portion attached to said cylindrical chamber upper end and tapering upwardly towards an upper end thereof provided at said reactant gas inlet, said funnel-shaped hood additionally having a lengthwise disposed axis that forms an acute angle with said cylindrical chamber vertical axis.
Dependencies are inferred from the claim text.