Semiconductor component comprising a planar pn-junction
AssigneeSiemens Aktiengesellschaft
InventorsUlrich Goesele, Reinhard Stengl
Life of this patent
Estimating the term…
Abstract
A semiconductor region that is inserted into a semiconductor member is provided, the latter being separated from the former by a planar pn junction including a first, more highly doped sub-region and a second, more lightly doped sub-region that is limited by a part of the pn junction that gradually approaches a boundary surface of the semiconductor member. An electrode contacts the semiconductor region and covers a part of the second sub-region and extends toward the lateral limitation of the semiconductor region to such an extent that, given the application of a voltage inhibiting the pn junction the space charge zone forming thereat has its edge lying in the boundary surface just reaching the electrode edge given a reduced breakdown voltage.
Claims17
A semiconductor component comprising a planar pn junction whereby a semiconductor region having a second conductivity type is provided at a boundary surface of a doped semiconductor member having a first conductivity type, a first sub-region of said semiconductor region being bounded by a part of the pn junction extending roughly parallel to the boundary surface and a second sub-region of said semiconductor region is separated from a remaining part of the semiconductor member by a part of the pn junction that approaches the boundary surface and laterally limits the semiconductor region in the boundary surface and laterally limits the semiconductor region in the boundary surface, the doping concentration of the second sub-region being lower than that of the first sub-region and the semiconductor region and the semiconductor member are each respectively contacted by a first and second electrode, the edge of the first electrode contacts the second sub-region and this edge is brought toward the lateral limitation of the semiconductor region that lies in the boundary surface to such an extent that, given the application of a voltage inhibiting the pn junction that the space charge zone being formed at the pn junction has its edge lying in the boundary surface just reaching the first electrode given a reduced breakdown voltage.
A semiconductor component comprising a planar pn junction whereby a semiconductor region having a second conductivity type is provided at a boundary surface of a doped semiconductor member having a first conductivity type, a first sub-region of said semiconductor region being bounded by a part of the pn junction extending roughly parallel to the boundary surface and a second sub-region of said semiconductor region is separated from a remaining part of the semiconductor member by a part of the pn junction that approaches the boundary surface and laterally limits the semiconductor region in the boundary surface, the doping concentration of the second sub-region being lower than that of the first sub-region and the semiconductor region and the semiconductor member are each respectively contacted by a first and second electrode, the edge of the first electrode contacts the second sub-region and this edge is brought toward the lateral limitation of the semiconductor region that lies in the boundary surface to such an extent that, given the application of a voltage inhibiting the pn junction that the space charge zone being formed at the pn junction has its edge lying in the boundary surface just reaching the first electrode given a reduced breakdown voltage, the semiconductor region is composed of a first base layer of a thyristor, the semiconductor member is formed of a second base layer and of a second emitter adjacent thereto in the thyristor, a first emitter is provided having a conductivity type that is opposite to that of the second emitter and is inserted into the first base layer, the first electrode including an electrode contacting the first emitter and the first base layer, and the second electrode contacts the second emitter of the thyristor, the electrode contacting the first emitter and the first base layer includes two parts, a first part being constructed from polycrystalline silicon and contacts the second sub-region of the first base layer and a second part includes a conductive coating that overlaps the first part at the edge side thereof.
A semiconductor comprising a planar pn junction whereby a semiconductor region having a second conductivity type is provided at a boundary surface of a doped semiconductor member having a first conductivity type, a first sub-region of said semiconductor region being bounded by a part of the pn junction extending roughly parallel to the boundary surface and a second sub-region of said semiconductor region is separated from a remaining part of the semiconductor member by a part of the pn junction that approaches the boundary surface and laterally limits the semiconductor region in the boundary surface, the doping concentration of the second sub-region being lower than that of the first sub-region and the semiconductor region and the semiconductor member are each respectively contacted by a first and second electrode, the edge of the first electrode contacts the second sub-region and this edge is brought toward the lateral limitation of the semiconductor region that lies in the boundary surface to such an extent that, given the application of a voltage inhibiting the pn junction that the space charge zone being formed at the pn junction has its edge lying in the boundary surface just reaching the first electrode given a reduced breakdown voltage, the doping concentration of the second sub-region decreases in a direction toward the lateral limitation of the semiconductor region proceeding from a doping concentration that is present at the boundary to the first sub-region, the semiconductor region is composed of a first base layer of a thyristor, the semiconductor member is formed of a second base layer and of a second emitter adjacent thereto in the thyristor, a first emitter having a conductivity type that is opposite to that of the second emitter is inserted into the first base layer, the first electrode being composed of an electrode contacting the first emitter and the first base layer, and the second electrode contacts the second emitter of the thyristor.
A semiconductor component comprising:
- a planar- pn junction wherein a semiconductor region having a second conductivity type is provided at a boundary surface of a doped semiconductor member having a first conductivity type:
- the semiconductor including a first region sub-region that is bounded by a part of the pn junction that extends roughly parallel to the boundary surface, and a second sub-region that is separated from the remaining part of the semiconductor member by a part of the pn junction that extends towards the boundary surface and laterally limits the semiconductor region in the boundary surface:
- the second sub-region including a doping concentration that is lower than a doping concentration the first sub-region;
- the semiconductor region and the semiconductor member are each respectively contacted by a first and second electrode, the edge of the first electrode contacts the second sub-region and extends towards the lateral limitation of the semiconductor region that lies in the boundary surface and is so constructed and arranged that, given application of a voltage inhibitng the pn junction that the space charge zone being formed at the pn junction has its edge lying in the boundary surface just reaching the first electrode given a reduced breakdown voltage.
A semiconductor component comprising:
- a planar pn junction wherein a semiconductor region having a second conductivity type is provided at a boundary surface of a doped semiconductor member having a first conductivity type;
- the semiconductor including a first region sub-region that is bounded by a part of the pn junction that extends roughly parallel to the boundary surface, and a second sub-region that is separated from the remaining part of the semiconductor member by a part of the pn junction that extends towards the boundary surface and laterally limits the semiconductor region in the boundary surface;
- the second sub-region including a doping concentration that is lower than a doping concentration the first sub-region;
- the semiconductor region and the semiconductor member are each respectively contacted by a first and second electrode, the edge of the first electrode contacts the second sub-region and extends towards the lateral limitation of the semiconductor region that lies in the boundary surface and is so constructed and arranged that, given application of a voltage inhibiting the pn junction that the space charge zone being formed at the pn junction has its edge lying in the boundary surface just reaching the first electrode given a reduced breakdown voltage;
- the doping concentration in the second sub-region decreases from a concentration that is approximately equal to that present at the boundary of the first sub-region;
- and
- wherein the electrode contacting a first emitter and a first base layer includes two parts, a first part being constructed from polycrystalline silicon and contacts the second sub-region of the first base layer and a second part includes a conductive coating that overlaps the first part at the edge side thereof.
Dependencies are inferred from the claim text.