Exposure apparatus
AssigneeCanon Kabushiki Kaisha
InventorMasato Aketagawa
Life of this patent
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Abstract
An exposure apparatus for exposing, to a pattern of a first object, a second object by use of light is disclosed. The apparatus includes a light source for supplying light having a predetermined wavelength, for exposing the second object to the pattern of the first object, a detecting device for detecting a change in the wavelength of the light from the light source, and a control device operable in response to a signal from the detecting device, to bring the second object substantially unexposed to the pattern of the first object.
Claims14
An exposure apparatus for exposing, to a pattern of a first object, a second object by use of a radiation beam, said apparatus comprising:
- illuminating means for illuminating the first object with a radiation beam having a predetermined wavelength;
- detecting means for detecting a change in the wavelength of the radiation beam irradiating the first object;
- and
- control means operable in response to a signal from said detecting means, to cause the second object to be substantially unexposed to the pattern of the first object.
A projection exposure apparatus for projecting a pattern of a first object upon a second object through a projection lens system to expose the second object to the pattern of the first object, said apparatus comprising:
- a first stage for supporting the first object;
- a second stage for supporting the second object, said second stage being movable;
- illumination means for illuminating the first object with a light having a predetermined wavelength, so that the second object is exposed to the pattern of the first object;
- detecting means for detecting a change in the wavelength of the light irradiating the second object;
- and
- control means operable in response to a signal from said detecting means, to control said apparatus so as to cause the second object to be substantially unexposed to the pattern of the first object.
An exposure apparatus for exposing an object, said apparatus comprising:
- a radiation source for emitting a radiation beam having a predetermined wavelength;
- a radiation system for directing the radiation beam from said radiation source to the object for exposure thereof;
- openable and closable beam-blocking means provided in the path of the radiation beam;
- a beam splitter disposed in the path of the radiation beam between said radiation source and said beam-blocking means;
- detecting means disposed to receive a portion of the radiation beam from said beam splitter, for detecting a change in the wavelength of the radiation beam during exposure;
- and
- control means for controlling said beam-blocking means in response to a signal from said detecting means, to cause the object to be substantially unexposed to the radiation beam.
An exposure apparatus for exposing an object, said apparatus comprising:
- means for directing a radiation beam having a predetermined wavelength to the object;
- means for detecting a change in the wavelength of the radiation beam irradiating the object;
- and
- control means operable in response to a signal from said detecting means to control the apparatus so as to cause the object to be substantially unexposed to the radiation beam.
A projection exposure apparatus for projecting a pattern of a reticle upon different shot areas on a wafer in a predetermined order, by use of a projection lens system, said apparatus comprising:
- a reticle stage for supporting the reticle;
- a wafer stage for supporting the wafer, said wafer stage being movable in a plane perpendicular to an optical axis of the projection lens system;
- illuminating means for illuminating the reticle with light having a predetermined wavelength;
- detecting means for detecting a change in the wavelength of the light irradiating the reticle;
- and
- control means operable in response to a signal from said detecting means, to control said apparatus so as to cause the wafer to be substantially unexposed to the pattern of the reticle, said control means having a memory for memorizing a shot area on the wafer having been exposed to the pattern of the reticle with the light whose wavelength has been changed.
Dependencies are inferred from the claim text.