Immersion development and rinse machine and process
AssigneeTexas Instruments Incorporated
InventorsWilliam E. Lamb, Jerome L. Kowaleski, Vojtech Haikl, Alan R. Bittancourt, Harvey S. Daugherty
Life of this patent
Estimating the term…
Abstract
A method of processing semiconductor wafers to develop photoresist patterns which includes mounting a semiconductor on a vacuum chuck, immersing and spinning the semiconductor wafer in a developer fluid, removing the semiconductor wafer from the semiconductor wafer from the developer fluid, lowering the semiconductor wafer into the rinse bath, then removing the semiconductor wafer from the rinse bath and spin drying it.
Claims4
A method of processing semiconductors in a two tank processing apparatus to develop photoresist patterns thereon, comprising the steps of;
- mounting a semiconductor on a vacuum chuck, immersing and spinning the semiconductor wafer upside down in a developer fluid in a first tank, circulating and filtering the developer in a controlled up-flow system, maintaining the developer solution at a constant developer strength, filling the space above the developer fluid with nitrogen while the wafer is being developed, removing the semiconductor wafer from the developer fluid, lowering the semiconductor wafer into a rinse bath in a second tank, then removing the semiconductor wafer from the rinse bath and spin drying it.
Dependencies are inferred from the claim text.