Photoresist compositions containing selected 6-acetoxy cyclohexadienone photosensitizers and novolak resins
AssigneeOlin Corporation
InventorsSydney G. Slater, Stanley A. Ficner
Life of this patent
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Abstract
A light-sensitive mixture useful as a negative-working photoresist composition comprising: (a) at least one novolak resin; and (b) at least one 6-acetoxy cyclohexadienone compound of the formula (I) below: ##STR1## wherein R.sub.1, R.sub.2, R.sub.3, R.sub.4 and R.sub.5 are individually selected from hydrogen and lower alkyl groups having from 1 to 4 carbon atoms with the proviso that at least three of the R.sub.1 to R.sub.5 groups are lower alkyl groups.
Claims12
A light-sensitive mixture useful as a negative-working photoresist composition comprising:
- (a) at least one novolak resin;
- and
- (b) at least one 6-acetoxy cyclohexadienone compound of the formula (I) below:
- ##STR3## wherein R.sub.1, R R.sub.3, R.sub.4 and R.sub.5 are individually selected from hydrogen and lower alkyl groups having from 1 to 4 carbon atoms with the proviso that at least three of the R.sub.1 to R.sub.5 groups are lower alkyl groups.
A coated substrate comprising a substrate material coated with a film of a light-sensitive mixture comprising:
- (a) at least one novolak resin;
- and
- (b) at least one 6-acetoxy cyclohexadienone compound of the formula (I) below:
- ##STR4## wherein R.sub.1, R.sub.2, R.sub.3, R.sub.4 and R.sub.5 are individually selected from hydrogen and lower alkyl groups having from 1 to 4 carbon atoms with the proviso that at least three of the R.sub.1 to R.sub.5 groups are lower alkyl groups.
The process of developing an image-wise exposed photoresist-coated substrate comprising:
- (1) coating said substrate with a light-sensitive composition useful as a negative-working photoresist, said composition comprising:
- (a) at least one novolak resin;
- and
- (b) at least one 6-acetoxy cyclohexadienone compound of the formula (I) below:
- ##STR5## wherein R.sub.1, R.sub.2, R.sub.3, R.sub.4 and R.sub.5 are individually selected from hydrogen and lower alkyl groups having from 1 to 4 carbon atoms with the proviso that at least three of the R.sub.1 to R.sub.5 groups are lower alkyl groups;
- (2) subjecting said coating on said substrate to an image-wise exposure of radiant light energy;
- and
- (3) subjecting said image-wise exposed coated substrate to a developing solution wherein the unexposed areas of said light-exposed coating are dissolved and removed from the substrate, having a negative image-wise pattern in the coating.
Dependencies are inferred from the claim text.