Modified horizontal bridgman method for growing GaAs single crystal
AssigneeIndustrial Technology Research Institute
InventorsTzer-Perng Chen, Yih-Der Guo, Tsun-Tsai Chang
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AssigneeIndustrial Technology Research Institute
InventorsTzer-Perng Chen, Yih-Der Guo, Tsun-Tsai Chang
Estimating the term…
A process for growing a gallium arsenide single crystal from a polycrystalline gallium arsenide by the horizontal Bridgman technique includes (a) melting the polycrystalline gallium arsenide in a quartz boat which is placed in a quartz tube, at a temperature greater than 1238 deg C. but lower than the melting point of quartz, (b) decreasing the temperature of the melt of gallium arsenide from the seed/melt interface by moving a furnace to crystallize the melt, and (c) annealing the crystallized gallium arsenide during the crystal growth process at a temperature of 1100-1220 deg C.; wherein the above steps are carried out in the absence of an As vapor pressure controlling zone which is kept at a temperature of about 617 deg C. Due to the anealing step, the thermal stress is small and the dislocation hardly occurs. A short quartz tube can be employed due to the absence of the As zone.
A process for growing a gallium arsenide single crystal from a polycrystalline gallium arsenide by the horizontal Bridgman technique comprising:
Dependencies are inferred from the claim text.