US 4,902,350 AGranted

Method for rinsing, cleaning and drying silicon wafers

AssigneeRobert F. Orr

InventorRicky B. Steck

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Abstract

Apparatus and method for cleaning, rinsing and drying thin wafers such as silicon wafers or other disc-like substrates or elements wherein the wafers are rinsed in a hot water bath while supported in a conventional slotted carrier. The wafers are cleaned and rinsed while being moved through a planar beam of sonic energy in a water bath. Drying of the wafers is achieved by slowly raising the wafers out of the water bath such that the water surface tension at the surface of the water bath evenly and effectively draws off water from the rinsing surfaces of the wafers. A novel lift mechanism is provided for moving the wafers through the beam of sonic energy in the water bath and for slowly lifting the wafers and the cassette in independent movements through the surface of the water such that there is no contact between the wafers and the cassette or between the cassette and any other object at the point where the cassette and wafers move through the surface of the water.

Claims10

Dependent claims

A method of cleaning, rinsing and drying relatively thin, plate-like articles which can be supported edgewise, said method comprising the steps of:

(a) maintaining a body of hot, deionized water contained in a tank;
(b) placing articles to be cleaned, rinsed and dried in a slotted carrier wherein the articles are supported edgewise along the opposite sides of said slotted carrier in spaced, parallel, coaxial relation;
(c) submerging said slotted carrier and the articles which are to be cleaned, rinsed and dried in the body of hot, deionized water contained in the tank;
(d) introducing hot, deionized water into said tank through a diffuser to create a laminar flow of hot, deionized water upwardly through said tank and about said articles and slotted carrier which are submerged in the body of hot, deionized water;
(e) producing a beam of sonic energy in the body of hot, deionized water in said tank above said articles and slotted carrier;
(f) slowly raising a lift element upwardly through an opening in the bottom of said slotted carrier to (1) engage the bottom edges of said articles, (2) slowly lift the articles out of the slotted carrier, (3) slowly move the articles through the beam of sonic energy in the body of water and (4) slowly move the articles through the surface of the body of hot, deionized water in said tank to a position above the surface of the body of hot, deionized water in said tank;
and
(g) slowly raising the slotted carrier upwardly such that the slotted carrier (1) follows at a spaced distance the respective lift element and articles through the body of hot, deionized water and the surface of the body of hot deionized water in said tank and then (2) reengages the articles at a position above the surface of the body of hot, deionized water in said tank,
wherein the movement of said slotted carrier and said lift element is sufficiently slow that the deionized water is drawn from the articles and the slotted carrier by water surface tension as the articles and slotted carrier move across the interface with the surface of the deionized water.

6 more elements

A method of rinsing and drying relatively thin, plate-like articles which can be supported edgewise, said method comprising the steps of:

(a) maintaining a body of hot, deionized water contained in a tank;
(b) placing articles to be rinsed and dried in a slotted carrier where in the articles are supported edgewise along the opposite sides of said slotted carrier in a paced, parallel, coaxial relation;
(c) submerging said slotted carrier and the articles which are to be rinsed and dried in the body of hot, deionized water contained in the tank;
(d) introducing hot, deionized water into said tank through a diffuser to create a laminar flow of hot, deionized water upwardly through said tank and about said articles and slotted carrier which are submerged in the body of hot, deionized water;
(e) maintaining the articles and slotted carrier submerged in said tank for a time sufficient to rinse said articles;
(f) slowly raising a lift element upwardly through an opening in the bottom of said slotted carrier to (1) engage the bottom edges of said articles, (2) slowly lift the articles out of the slotted carrier and (3) slowly move the articles through the surface of the body of hot, deionized water in said tank to a position above the surface of the body of hot, deionized water in said tank;
and
(g) slowly raising the slotted carrier upwardly such that the slotted carrier (1) follows at a spaced distance the respective lift elements and articles through the surface of the body of hot deionized water in said tank and than (2) reengages the articles at a position above the surface of the body of hot, deionized water in said tank,
wherein the movement of said slotted carrier and said lift element is sufficiently slow that the deionized water is drawn from the articles and the slotted carrier by water surface tension as the articles and slotted carrier move across the interface with the surface of the deionized water.

6 more elements

Dependencies are inferred from the claim text.