Loading patent…
AssigneeTokyo Ohka Kogyo Co., Ltd.
InventorsMuneo Nakayama, Akira Hashimoto, Toshihiro Nishimura, Eiichi Kashiwagi, Isamu Hijikata
Estimating the term…
A coating solution for forming a silica-based film, having a given viscosity, is coated on a substrate such as a silicon wafer, this coating solution is dried to form a silica-based film, and this silica-based film is exposed to ultraviolet radiation in an atmosphere containing ozone at room temperature or while heating it preferably at a temperature of not more than 300.degree. C., particularly at a temperature of from 50.degree. to 200.degree. C., by means of a heating member such as a hot plate. The film quality of the silica-based film can be improved by exposing it to ultraviolet radiation in the atmosphere containing ozone.
A method of improving the quality of a silica-based film, which comprises:
A method of improving the quality of a silica-based film, which comprises:
A method of improving the quality of silica-based film, which comprises:
A method of improving the quality of a silica-based film, which comprises:
Dependencies are inferred from the claim text.