Cross-flow diffusion furnace
AssigneeBTU Engineering Corporation
InventorsMorris Simson, John H. Fabricius, Ronnie Browne, Arthur Waugh, Robert F. Sarkozy, Chiu K. S. Lai
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Abstract
A longitudinally extending cross-flow liner within a longitudinally extending cylindrical reaction vessel cooperates with at least one longitudinally extending gas injector within the cross-flow liner to provide transversely flowing gas across the surfaces of vertically oriented semiconductor wafers in such a way as to substantially eliminate both depletion phenomenon and downstream wafer pollution caused from particulates, unreacted reactant gas, and other contaminants and to provide uniformly coated wafers in a batch and repeatability batch to batch.
Claims7
A cross-flow diffusion furnace for processing semiconductor wafers, comprising;
- a cylindrical diffusion tube defining a cylindrical reaction chamber
- an apertured cylindrical cross-flow liner disposed within said cylindrical diffusion tube and having one end open and one end closed and having an operative locale across which CVD takes place;
- a boat loader extending through said cross-flow liner open end into said cross-flow liner;
- means for removably fastening said boat loader in air tight sealing engagement to one end of said cylindrical diffusion tube;
- means coupled to said cylindrical diffusion tube for controllably heating said reaction chamber;
- a vacuum source;
- means for connecting said vacuum source to the other end of said cylindrical diffusion tube, the vacuum source producing a greater negative pressure interior to said cylindrical diffusion tube and exterior to said cross-flow liner than within said cross-flow liner;
- and
- means for injecting gas locally and axially along the operative locale of said cross-flow liner.
Dependencies are inferred from the claim text.