Substrate processing apparatus
AssigneeAnelva Corporation
InventorsNobuyuki Takahashi, Hiroaki Kitahara
Life of this patent
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AssigneeAnelva Corporation
InventorsNobuyuki Takahashi, Hiroaki Kitahara
Estimating the term…
A substrate processing apparatus includes input and output chambers for loading and unloading substrates into and out of the apparatus, a separation chamber connected to the input and output chambers, a plurality of substrate processing chambers connected to the separation chamber for processing the substrates therein, and gate valves provided between the separation chamber and the input and output chambers and between the separation chamber and the respective substrate processing chambers for selectively providing communication between the chambers between which the gate valves are arranged. The separation chamber is able to transfer the substrates therethrough, to distribute the substrate into the respective processing chambers and to temporarily maintain the substrate in the separation chamber. With this arrangement, the substrate processing apparatus is capable of effecting different processings of substrates by freely selecting the kinds, orders and repetitions of the processing for the substrates without any interference between these processings.
A substrate processing apparatus including input and output chambers for loading and unloading substrates into and out of the apparatus and at least one substrate processing chamber connected to said input and output chambers for applying a plurality of processings to the substrates, said apparatus comprising:
Dependencies are inferred from the claim text.