Photosensitive composition
AssigneeHitachi Chemical Company, Ltd.
InventorsMinoru Toriumi, Hiroshi Shiraishi, Ryotaro Irie, Shigeru Koibuchi
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Abstract
A photosensitive composition comprising (a) a photosensitive component such as an aromatic diazo compound or an aromatic azide, (b) a polymer and (c) a quaternary alkylammonium salt wherein each straight- or branched-chain alkyl group has 1 to 7 carbon atoms is suitable for producing a positive type or negative type photresist excellent in contrast and sensitivity in the microlithography of semiconductor elements.
Claims7
A photosensitive composition comprising an admixture containing
- (a) an aromatic azide compound represented by the formula:
- ##STR9## wherein Z and Y are independently an aromatic substituent or a heterocyclic substituent, at least one of said aromatic substituents or heterocyclic substituents having a photosensitive azido group;
- and n and m are independently 0 or 1,
- (b) an alkali-soluble polymer and
- (c) an alkylammonium compound represented by the formula:
- ##STR10## wherein R.sub.1, R.sub.2, R.sub.3 and R.sub.4 are independently a straight- or branched-chain alkyl group having 1 to 7 carbon atoms or at least one hydrogen atom of said alkyl group being substituted by an alkoxy group having 1 to 5 carbon atoms;
- and X is a chlorine, bromine or iodine atom or a hydroxyl group;
- (a), (b) and (c) being present in amounts sufficient to provide a negative type photoresist film.
A photosensitve composition according to claim 4, wherein R.sub.1, R.sub.2, R.sub.3 and R.sub.4 of the alkylammonium compound represented by the formula (1) are independently a straight- or branched-chain alkyl group having 5 carbon atoms.
Dependencies are inferred from the claim text.