Device for developing treatment of semiconductor materials
OwnerSeiichiro Aigoinventor
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Abstract
A device for developing treatment of a semiconductor material which is provided with a cup-shaped basin having a liquid inlet passage in its center portion and an annular flat upper portion and a chuck positioned above the basin and having a lower end surface for supporting the semiconductor material to be developed, the basin being provided on its upper portion with a ring for temporarily storing the developing liquid supplied to the upper portion of the basin, the ring having a diameter larger than the size of the semiconductor material and the passage being provided with an automatically operable valve.
Claims5
An apparatus for developing semi-conductor materials comprising:
- a cup-shaped basin having a center portion and an annular flat upper portion, said center portion having a liquid inlet passage, said inlet passage having an upper end;
- and
- a chuck positioned above said basin, said chuck having a lower end surface for attracting and supporting, under vacuum, the semi-conductor material to be developed;
- and
- a ring provided on said upper portion of said basin to temporarily store developing liquid supplied to said upper portion, said ring having a diameter larger than the size of said semi-conductor material;
- and
- a first automatically operable valve provided in said liquid inlet passage located below said upper end of said liquid inlet passage;
- and
- discharge means communicating with said basin for discharging developing liquid.
Dependencies are inferred from the claim text.