US 4,790,921 A · Planetary substrate carrier method and apparatus

Abstract

An inexpensive, vertically oriented multiple substrate carrier is disclosed for high-temperature, high vacuum film deposition systems. In one embodiment, the substrates have central circular openings and the carrier includes a plurality of supports on which the substrates hang, with each support, such as a vertically oriented sheave, engaging the perimeter of a substrate opening. As the carrier is rotated, planetary motion is imparted to the substrates to facilitate simultaneous, two-sided, substantially uniform deposition of a film. In another embodiment, the substrates are circular and are each supported for planetary motion and two sided deposition in a respective circular groove which bounds an opening through the carrier.

Claims6

Dependent claims

A method of supporting substrates during sputter deposition of a film onto the major surfaces of the substrates comprising the steps of:

hanging each of the substrates from a central substrate opening on a substrate support extending through the central substrate opening such that the substrates are supported in a vertical orientation;
transporting the substrates in a linear direction to a location disposed between first and second sputtering targets;
halting the linear motion of the substrates;
imparting planetary motion to the substrates;
simultaneously sputtering a film onto both surfaces of the substrates while the substrates are undergoing planetary motion;
and
halting the planetary motion.

4 more elements

A substrate carrier apparatus which supports one or more substrates, said carrier apparatus mounted for rotation on a rotatable support mechanism, said carrier apparatus disposed between first and second sputtering targets during deposition of a film onto the sides of said substrates, said substrate carrier apparatus comprising:

a chassis;
said chassis including means for engaging said rotatable support mechanism so as to support said chassis in a vertical orientation for rotation about a chassis axis by said rotatable support mechanism during deposition;
said chassis having a least one sputtering opening therethrough at a location spaced from said chassis axis, said sputtering opening having a diameter which is greater than the diameter of said substrate;
and
substrate support means for supporting a substrate in a vertical orientation for planetary motion upon rotation of said chassis, said substrate support means comprising means for supporting said substrate on a hub such that a first side of said substrate is exposed through said sputtering opening to the first sputtering target and a second side of said substrate is exposed to the second sputtering target, thereby permitting simultaneous deposition of both sides of the substrate.

2 more elements

Dependencies are inferred from the claim text.

Planetary substrate carrier method and apparatus

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Planetary substrate carrier method and apparatus

Life of this patent

Abstract

Claims6