X-ray exposure system
AssigneeHitachi, Ltd.
InventorsTakeshi Kimura, Kozo Mochiji, Shojiro Asai, Hidehito Obayashi
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Abstract
An X-ray exposure system including a plurality of X-ray exposure apparatuses each for duplicating a mask pattern on a semiconductor wafer by irradiating an X-ray mask and the semiconductor wafer with synchrotron radiation is disclosed in which a synchrotron radiation path branching device including a reflecting mirror is disposed between a synchrotron ring and the X-ray exposure apparatuses, and the propagation direction of the synchrotron radiation emitted from the synchrotron ring is changed by the reflecting mirror so that the synchrotron radiation from the ring can be introduced into each of the X-ray exposure apparatuses.
Claims14
An X-ray exposure system for receiving a single beam of synchrotron radiation (SR) from an SR source comprising a plurality of X-ray exposure apparatuses each for duplicating a mask pattern on a radiation sensitive material disposed for receiving said single beam of SR from said SR source through an X-ray mask, and SR path changing means being disposed between the SR source and the X-ray exposure apparatuses for selectively changing the propagation direction of the single beam of SR emitted from said SR source for selectively introducing an entirety of said single beam of SR into a different one of said X-ray exposure apparatuses, respectively.
An X-ray system for receiving a single beam of synchrotron radiation (SR) from and SR source, comprising and X-ray exposure apparatus for duplicating a mask pattern on a radiation sensitive material disposed for receiving said single beam of SR from said SR source through an X-ray mask, and at least one utilization apparatus disposed for receiving and utilizing said single beam of SR from said SR source, and SR path changing means being disposed between the SR source and the X-ray exposure apparatus and the utilization apparatus for selectively changing the propagation direction of the single beam of SR emitted from said SR source for selectively introducing said SR into one of said X-ray exposure apparatus and said utilization apparatus.
An X-ray exposure system for utilizing one synchrotron radiation (SR) beam, comprising:
- means for emitting one SR beam along a propagation path;
- a plurality of X-ray utilization devices arranged for receiving and utilizing the one SR beam therein;
- and
- means disposed along the propagation path of the SR beam for selectively changing the propagation direction of the one SR beam to enable application of the one SR beam to one of said utilization devices.
Dependencies are inferred from the claim text.