Photoresist composition comprising an interpolymer of a silicon-containing monomer and an hydroxystyrene
AssigneeEastman Kodak Company
InventorsDavid B. Bailey, Michael M. Feldman
Life of this patent
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Abstract
A photoresist composition comprises a photosensitive compound and an interpolymer of a silicon-containing monomer and an hydroxystyrene. The resist composition exhibits superior thermal stability and dissolution rate and good resistance to an oxygen plasma etch.
Claims5
A positive-working photoresist composition comprising in admixture a photosensitive o-quinone diazide compound which is responsive to activating radiation to provide a postive resist image after development and a film forming interpolymer having a glass transition temperature of at least 125.degree. C.;
- said interpolymer being an interpolymer of an hydroxystyrene and a silicon-containing monomer and wherein said interpolymer comprises recurring units having the structural formulae:
- ##STR4## wherein x is 1, 2 or 3,
- and each R.sup.1, R.sup.2 and R.sup.3 is independently alkyl containing from 1 to 6 carbon atoms, and ##STR5## wherein R.sup.4 is H or CH.sub.3, said hydroxystyrene being present in said interpolymer in an amount sufficient to render said composition developable in an aqueous alkaline developer and said silicon containing monomer being present in said interpolymer in an amount sufficient to render said photoresist composition resistant to an oxygen plasma etch.
A negative-working photoresist composition comprising in admixture a photosensitive bisazide compound which is responsive to activating radiation to provide a negative resist image after development and a film forming interpolymer having a glass transition temperature of at least 125.degree. C.;
- said interpolymer being an interpolymer of an hydroxystyrene and a silicon-containing monomer and wherein said interpolymer comprises recurring units having the structural formulae:
- ##STR6## wherein x is 1, 2 or 3,
- and each R.sup.1, R.sup.2 and R.sup.3 is independently alkyl containing from 1 to 6 carbon atoms, and ##STR7## wherein R.sup.4 is H or CH.sub.3, said hydroxystyrene being present in said interpolymer in an amount sufficient to render said composition developable in an aqueous alkaline developer and said silicon containing monomer being present in said interpolymer in an amount sufficient to render said photoresist composition resistant to an oxygen plasma etch.
Dependencies are inferred from the claim text.