Agent and method for the removal of photoresist and stripper residues from semiconductor substrates
AssigneeMerck Patent GmbH
InventorsKarl H. Neisius, Alois Litters
Life of this patent
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Abstract
Photoresist and stripper residues can be rapidly and completely removed from semiconductor substrates after the stripping process with an aqueous post-rinsing agent which contains a nonionogenic surfactant and an organic base.
Claims18
A method for removing photoresist and stripper residues from a substrate comprising treating with a post rinsing agent a substrate which has been subjected to photoresist stripping with a photoresist stripping agent and removed from said photoresist stripping agent, said post-rinsing agent comprising effective amounts of a nonionic surfactant and an organic base in aqueous solution, said organic base being water soluble to a degree whereby it will form a water-soluble salt with alkylbenzenesulfonic acids when the agent is contacted therewith.
A method of completely removing photoresist structures and residues from a substrate which has been subjected to photoresist imaging, comprising treating the substrate with a photoresist stripper, removing the substrate from the stripper, and treating the substrate with a post-rinsing agent comprising effective amounts of a nonionic surfactant and an organic base in aqueous solution, said organic base being water soluble to a degree whereby it will form a water soluble salt with alkylbenzenesulfonic acids when the agent is contacted therewith.
A combination of (a) a substrate which has been subjected to photoresist stripping with a photoresist stripping agent and removed from said photoresist stripping agent and has resultant photoresist or stripper residue thereon, and (b) an aqueous post rinsing agent in contact with said substrate, comprising effective amounts of a nonionic surfactant and an organic base in aqueous solution, said organic base being water soluble to a degree whereby it will form a water-soluble salt with alkylbenzenesulfonic acids when the agent is contacted therewith.
Dependencies are inferred from the claim text.