Vertical photoresist developer
AssigneeCircuit Chemistry Corporation
InventorsJames J. Czaja, John J. Herrmann
Life of this patent
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Abstract
Vertical photoresist developer for processing of any size of printed circuit boards carried on a processing cassette. The processing cassette is carried by a chain through a main chamber, a rinse chamber and a drying chamber, all the processing chambers in line with each other. The processing system is electromechanical and electrically controlled, as well as air and liquid flow control. The developer is system oriented and symmetrical in operation to either side of the board. A printed circuit board holder with gripper fingers mounted in removable plastic chain cassette carries the board through separable processing chambers.
Claims16
Printed circuit board chemical in line processing system comprising:
- a. load station;
- b. an inlet chamber;
- c. main chamber including a liquid sump;
- d. rinse chamber;
- e. drying chamber;
- f. an outlet chamber;
- g. unload station;
- h. an endless chain means extending through said load stations and said chambers, and housing means supporting each of said chambers and stations;
- i. substantially horizontally positioned fluid dispensing nozzles in said main, rinse, and driving chambers;
- j. means for electromechanically controlling flow and time of flow of fluid through said main, rinse, and drying chambers;
- and,
- k. at least one process cassette for engaging with said chain means and for accepting a printed circuit board for processing through each of said stations and said chambers, said process cassette including a substantially rectangular housing with a longitudinal V groove parallel to said endless chain means on a top side thereof, securing means on a bottom side thereof for securing to said endless chain means, and at least two opposing finger means extending outwardly with respect to each other of an opposing sides of said V groove.
Dependencies are inferred from the claim text.