Photosensitive composition and pattern forming process using same

A pattern forming process which comprises applying a photosensitive composition containing an admixture of at least one photosensitive diazonium compound selected from the group consisting of salts and double salts of diazonium ions represented by the general formulae:

• ##STR9## wherein A stands for a substituent selected from the group consisting of ##STR10## wherein R.sub.1 and R.sub.2 each stand for an alkyl or benzyl group, with the proviso that the total number of carbon atoms of R.sub.1 and R.sub.2 is 8 to 16, and 10 to 500% by weight, based on the weight of said diazonium compound, of at least one nitrate selected from the group consisting of calcium nitrate and magnesium nitrate, on a substrate to form a coating film thereon;
• subjecting the coating film to patternwise exposure to light to make the exposed portion sticky and contacting powder particles with the exposed film to have said particles deposited on the exposed portion.