Lithographic mask structure and lithographic process
AssigneeCanon Kabushiki Kaisha
InventorsHideo Kato, Yoshie Izawa, Keiko Chiba
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Abstract
There is disclosed a lithographic mask structure which comprises a masking material support film and an annular support substrate for supporting the masking material support film at the periphery, the masking material support film containing a fluorescent substance. Also disclosed is a lithographic process for exposing a photosensitive material to irradiation with a radiation beam through a masking material support film provided with a masking material pattern-wise.
Claims56
A lithographic mask structure which comprises a masking material support film and an annular support substrate for supporting the masking material support film at the periphery, the masking material support film containing a fluorescent substance.
A lithographic mask structure which comprises a masking material support film and an annular support substrate for supporting the masking material support film at the periphery, the masking material support film being composed of a fluorescent substance.
A lithographic process which comprises exposing a photosensitive material to irradiation with a radiation beam through a masking material support film provided with a masking material pattern-wise, the masking material support film being composed of a fluorescent substance, a secondary radiation beam being generated from the fluorescent substance exposed to the radiation beam, and the photosensitive material being exposed to the secondary radiation beam and the radiation beam together.
A lithographic process which comprises exposing a photosensitive material to irradiation with a radiation beam through a masking material support film provided with a masking material pattern-wise, the masking material support film containing a fluorescent substance, a secondary radiation beam being generated from the fluorescent substance exposed to the radiation beam, and the photosensitive material being exposed to the secondary radiation beam and the radiation beam together.
Dependencies are inferred from the claim text.