Electroconductive thin film
AssigneeRicoh Company, Ltd.
InventorYoshihito Osada
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Abstract
This invention relates to an electroconductive thin film prepared by forming a polymerized thin film on a substrate in a vacuum reactor by the decomposition of a metal complex starting material by glow discharge, said metal complex having a ligand selected from the group consisting of acetylacetonate and at least partially fluorinated acetylacetonate.
Claims10
In an electroconductive thin film and substrate combination, the improvement comprising;
- said electroconductive thin film and substrate combination being prepared by forming a polymerized film on said substrate in a vacuum reactor by the decomposition of a metal complex starting material by glow discharge, said metal complex having a ligand selected from the group consisting of acetylacetonate and at least partially fluorinated acetylacetonate.
A substrate coated with an electroconductive thin plasma-polymerized film which film has high switching and memory functions and has a thickness of from 50 Angstrom units to 5 macrometers, said film having been formed on said substrate by placing in a vacuum reactor (1) said substrate and (2) a metal complex having the formula ##STR4## wherein X.sup.1 to X.sup.7, which can be the same or different, are H or F;
- n is an integer of 1 to 4;
- m is an integer of 0 to 5;
- and M is selected from the group consisting of Sc, Ti, V, Cr, Mn, Fe, Co, Ni, Cu and Zn, and subjecting said complex to glow discharge decomposition conditions effective to form said film on said substrate by plasma polymerization.
Dependencies are inferred from the claim text.