Process for regenerating an electroless copper plating bath
AssigneeInternational Business Machines Corporation
InventorWerner D. Bissinger
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AssigneeInternational Business Machines Corporation
InventorWerner D. Bissinger
Estimating the term…
A process and an apparatus are described for regenerating an electroless copper plating bath containing a complexing agent, preferably ethylenediamine tetraacetic acid. From the bath solution to be regenerated, the copper content is reduced by electrolysis to a value below 20 mg/l and the complexing agent subsequently precipitated by acidification and recovered. After dissolution in an alkaline electrolytic solution, the solution thus obtained is fed back to the electroless copper plating bath. A particularly pure ethylenediamine tetraacetic acid free from by-products is obtained if the pH value is kept constant during electrolysis, an anodic current density i.sub.+ of 100 A/m.sup.2 is not exceeded, and the anodic current density during electrolysis is reduced according to the electrolysis characteristic or in steps.
A process for regenerating a complexing agent in an electroless copper plating bath, comprising the steps of:
A process for regenerating a complexing agent in an electroless copper plating bath, comprising the steps of:
A process for regenerating a complexing agent in an electroless copper plating bath, comprising the steps of:
A process for regenerating a complexing agent in an electroless copper plating bath, comprising the steps of:
A process for regenerating a complexing agent in an electroless copper plating bath, comprising the steps of:
A process for regenerating a complexing agent in an electroless copper plating bath, comprising the steps of:
A process for regenerating a complexing agent in an electroless copper plating bath, comprising the steps of:
A process for regenerating a complexing agent in an electroless copper plating bath, comprising the steps of:
Dependencies are inferred from the claim text.