EEPROM with metal doped insulator
AssigneeHughes Microelectronics Limited
InventorsJames L. West, Alan E. Owen, Komanduri V. Krishna, Jaoquim J. Delima
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Abstract
Insulating layers responsible for the trapping of electric charge in non-volatile semiconductor memories, such as FAMOS or MNOS, are fabricated as thicker layers when doped with metals having partially filled d or f electron shells. Typically the insulating layer is silicon oxide doped with up to 10 atomic % of a first transition series metal.
Claims9
A semiconductor memory device wherein non-volatile information is retained by storage of electrical charge trapped in or at a layer of the device surrounded by a dielectric layer, at least a portion of said dielectric layer comprising an amorphous inorganic oxide and/or nitride insulating material doped with a metal whose atomic number is 21 to 28, 39 to 45, or 57 to 78.
Dependencies are inferred from the claim text.