US 4,733,087 AGranted

Ion beam treating apparatus

AssigneeHitachi, Ltd.

InventorsMasamichi Narita, Yoshio Miura, Hideaki Kikuchi

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Abstract

A tilting mechanism tilts the wafer holding portions for wafers in any direction with respect to the direction of ion beams emitted from an ion source. The tilting mechanism is comprised of a linking mechanism for transmitting the rotation of the receiving plates to the wafer holding portions, tilted links for tilting the wafer holding portions, and a shaft being coupled to the tilted links and moving in the rotary disc. The wafer holding portions provide spherical portions, and the spherical portions are inserted in the receiving plates. A pin of the preceiving plates is fitted into the groove of the wafer holding portion. The distances between the ion source and the respective wafers are maintained equal. The ion beam irradiates uniformly the respective wafers and treats uniformly the respective wafers.

Claims9

Dependent claims

An ion beam treating apparatus comprising:

a vacuum vessel;
a plurality of work piece holding portions for holding work pieces that are to be treated in said vacuum vessel;
rotary receiving plates on which said work piece holding portions are mounted;
a rotary disc for rotating said rotary receiving plates;
a driving device for driving said rotary disk;
and a tilting mechanism for tilting said work piece holding portions in any direction with respect to the direction of ion beam emitted from an ion source;
wherein said tilting mechanism is comprised of a linking mechanism for transmitting the rotation of said rotary receiving plates to said work piece holding portions, titled links for tilting said work piece holding portions, a shaft being coupled to said tilted links and mounted for axial movement in said rotary disk at the center thereof, and moving means for moving said shaft, so that distances are maintained equal between the ion source and the work pieces to be treated, and each of the work pieces are irradiated with the ion beam with a uniform intensity.

4 more elements

Dependencies are inferred from the claim text.