Novel mixed ester O-quinone photosensitizers
AssigneeHoechst Celanese Corporation
InventorsRobert E. Potvin, Jonas O. St. Alban, Chester J. Sobodacha
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Abstract
The invention relates to new mixed ester photosensitive compounds and photosensitizer compositions comprised thereof. The photosensitive compounds and photosensitizer compositions are prepared by condensing phenolic compounds with a 1,2-naphthoquinonediazide-5-sulfonic acid halide and an organic acid halide in specific ratios. Photoresist compositions comprising the photosensitive compounds and photosensitizer compositions are also disclosed. The photosensitizer compositions exhibit excellent solution stability and resistance to precipitation when formulated in alkali-soluble resin photoresist compositions. The photoresist compositions have enhanced lithographic properties.
Claims17
A photoresist composition having improved solution stability comprising an admixture of a novolak or polyvinyl phenol resin, a solvent and a photosensitizer composition comprising the condensation product of:
- I. A phenolic compound having the structure:
- ##STR40## wherein:
- R.sub.a is H, OH, halogen or lower alkyl, with at least two and not greater than six R.sub.a radicals being OH, and X is a single C--C bond, --O--, --S--, --SO.sub.2 --, ##STR41## --(CH.sub.2).sub.n --, or ##STR42## n is 1 or 2;
- II. A 1,2 naphthoquinonediazide-5-sulfonic acid (Diazo);
- and
- III. An organic acid represented by the formula
- W--R.sub.3
- wherein W is ##STR43## or --SO.sub.2 --V, V is halogen and R.sub.3 is alkyl, aryl, substituted alkyl or substituted aryl;
- wherein the molar ratio of the amount of Diazo reacted to the amount of organic acid reacted is in the range of from about 1:2 to about 19:1, and the amount of Diazo and organic acid reacted with said phenolic compound being sufficient to produce a photosensitizer composition capable of inhibiting the dissolution rate of an alkali soluble resin in alkaline developing solution.
A photoresist composition having improved solution stability comprising an admixture of novolak or polyvinyl phenol resin, a solvent and a photosensitizer composition comprising the condensation product of:
- I. A phenolic compound having the structure:
- ##STR44## wherein:
- R.sub.a is H, OH, halogen or lower alkyl, with at least two and not greater than six R.sub.a radicals being OH;
- II. A 1,2 naphthoquinonediazide-5-sulfonic acid (Diazo);
- and
- III. An organic acid halide represented by the formula:
- W--R.sub.3
- wherein W is ##STR45## or --SO.sub.2 --V, V is halogen and R.sub.3 is alkyl, aryl, substituted alkyl or substituted aryl;
- wherein the molar ratio of the amount of Diazo reacted to the amount of organic acid reacted is in the range of from about 2:3 to about 19:1, and the amount of Diazo and organic acid reacted with said phenolic compound being sufficient to produce a photosensitizer composition capable of inhibiting the dissolution rate of an alkali soluble resin in alkaline developing solution.
Dependencies are inferred from the claim text.