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US 4,732,793 AGranted
Method and apparatus for laser-induced CVD
AssigneeMitsubishi Denki Kabushiki Kaisha
InventorHiromi Itoh
Life of this patent
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Abstract
A laser-induced CVD method in accordance with this invention comprises the steps of: setting a substrate in a reactive gas; applying a laser beam to the reactive gas to decompose it and produce not only free radicals but also ions due to multiphoton absorption; and applying an electric field thereby to efficiently transport the ions toward the substrate and deposit a thin film on the substrate at an increased deposition rate.
Claims8
A laser-induced CVD apparatus comprising;
- a reaction chamber;
- a vacuum pump for evacuating said chamber;
- a gas supplier for supplying said chamber with a reactive gas;
- a susceptor in said chamber for supporting a substrate on which a thin film is to be deposited;
- a generally flat electrode provided opposite to said susceptor;
- a laser source for emitting a laser beam to decompose said reactive gas and produce not only free radicals but also ions due to multiphoton absorption;
- a DC power supplier connected between said electrode and said susceptor for generating an electric field therebetween, whereby said ions are efficiently transported toward said substrate and thus said film is deposited at an increased deposition rate;
- and
- a mercury lamp means for applying ultraviolet to said substrate, whereby electrification of said film during deposition may be cancelled by electrons injected from said substrate due to a photoelectric effect.
6 more elements
Dependencies are inferred from the claim text.