US 4,731,316 AGranted

Photosensitive composition

AssigneesMitsubishi Chemical Industries Limited, Konishiroku Photo Industry Co., Ltd.

InventorsHiroshi Tomiyasu, Yoshihiro Maeda, Kiyoshi Goto, Norihito Suzuki

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Abstract

A photosensitive composition of this invention comprises: (a) a photosensitive diazo resin represented by the following general formula (I): ##STR1## wherein R.sup.1, R.sup.2 and R.sup.3 each represents a hydrogen atom, an alkyl or alkoxy group, R represents a hydrogen atom, an alkyl or phenyl group, X represents PF.sub.6 or BF.sub.4 and n represents a number of 1 to 200, in which a resin with the number n in the above formula being 5 or more is contained by more than 20 mol %, (b) an oleophilic high molecular weight compound with hydroxyl group and (c) a high molecular weight organic acid without hydroxyl group, and in which the content of the ingredient (c) is from 1.5 to 30% by weight based on the solid matter in said composition. The photosensitive composition of this invention can provide a photosensitive layer having high sensitivity and being excellent in storage stability and developability as well as excellent in the film strength.

Claims19

Dependent claims

A photosensitive composition, comprising an admixture of:

(a) a photosensitively effective amount of a photosensitive diazo resin of formula (I):
##STR4## wherein R.sup.1, R.sup.2 and R.sup.3 each represents hydrogen, alkyl or alkoxy, R represents hydrogen, alkyl or phenyl, X represents PF.sub.6 or BF.sub.4 and n represents a number from 1 to 200, and wherein the fraction of resin which has a molecular weight defined by the number n in the above formula as 5 or more is than 20 mol% of the total diazo resin present;
(b) a bindingly effective amount of an oleophilic high molecular weight compound which contains aromatic or aliphatic hydroxyl groups in a side chain thereof prepared from a monomer composition containing acrylic acid, methacrylic acid and derivatives thereof as monomeric units;
(c) a water soluble high molecular weight, non-hydroxyl group containing organic acid which contains carboxylic acid groups, said ingredient (c) being present in an amount of from 1.5 to 30% by weight based on solid matter in said composition.

1 more element

Dependencies are inferred from the claim text.