Process for the production of photographic images utilizing a negative working diazo contact film

A process for the production of a processed photographic element capable of functioning as a photomask which comprises coating a transparent support with a photosensitive composition and drying, then imagewise exposing said coating to a patter of actinic radiation and subsequently developing said exposed coating with a developer, said coating comprising in admixture a light sensitive negative working diazonium composition having a light absorbency of about 45% of less, when exposed to an energy source in the range of from about 350 to about 390 nanometers, said percentage light absorbency being determined using a spectrophotometer by comparing the absorbency of 0.001 grams of said diazonium composition dissolved in 100 milliliters of a solvent to the absorbency of 100 milliliters of said solvent, and a colorant composition comprising a mixture of dyes, said coating having a light transmission of not more than about 0.1% in the 350 to 390 nanometer range, and is capable of being rendered substantially insoluble upon exposure to ultraviolet radiation at an energy level of from at least about 15 mJ/cm.sup.2 and wherein the non-radiation-exposed areas are substantially removable upon treatment with a developer.